Formulation Chemicals

post etch/ash residual removal/PR stripper and speciality etchant

Purchem's patented formulation ASC-01, ASC-02 and ASC-03 are aqeous and semi-aqueous based chemicals with None-HDA compositions down to 20 nm.

Our cutting edge technology offers the best solution for the applications on post etching/ashing residual removal for Al/Cu BEOL, PR stripping and selective wet etching process. 

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