ASC-01 is a 100% aqueous chemical formulation, free from HDA, designed for single-spin tool applications. It is suitable for various semiconductor fabrication processes, including post Al/W etching,/ashing cleaning, poly-silicon etching, and PAT cleaning. For more details, please contact us. 

ASC-02 is a sem-i aqueous chemical formulation, free from HDA, designed for batch type tool applications. It is suitable for various semiconductor fabrication processes, including post Al etching/ashing cleaning, PAT cleaning and PR stripping. For more details, please contact us. 

ASC-03 is a sem-i aqueous alkaline based chemical formulation, designed for monocrystal silicon etching with controllable selectivity. For more details, please contact us.