Chemical Formula:NH2OH  

CAS: 7803-49-8

Hydroxyl amine is a versatile chemical widely used in semiconductor fabrication for its excellent reducing and cleaning properties. It is commonly applied in processes such as photoresist stripping, post-etch residue removal, and surface preparation, ensuring precision and high performance in device manufacturing.

Chemical Formula:C15H10O2  

CAS: 723-62-6

9-Anthracenecarboxylic acid is a specialized organic compound used in semiconductor fabrication for its properties as a photochemical agent (BARC) and surface modifier. It plays a role in processes like photoresist formulations and enhancing surface adhesion, contributing to precision and efficiency in advanced microfabrication techniques. 

Chemical Formula: (CH2)4SO2 

CAS: 126-33-0

Sulfolane is a highly stable, polar solvent widely used in semiconductor fabrication for its exceptional ability to dissolve a variety of organic and inorganic compounds. Its properties make it ideal for critical cleaning, etching, and chemical formulations, ensuring precision and reliability in advanced manufacturing processes.